Load-lock Sputtering System

The Load-lock Sputtering System is a device used in both industry and research to carry out the process of sputtering materials onto the surfaces of sample materials, typically in a controlled vacuum or atmospheric environment. The primary functions of the Load-lock Sputtering System include:
– Material sputtering onto surfaces.
– Creating protective coatings.
– Generating nano and microstructures.
– Examining and researching materials.
– Applications in both industry and research.

  • Model: DS 4004
  • Manufacturer: DADA
  • Origin: Korea

Description

Main Chamber:
– Chamber Φ500*410H, SUS304: 01
– CF10″ Substrate Port: 01
– CF8″ Pumping Port: 01
– Cathode port: 04
– CF2.75″ Gauge, Extra Port: 05
– Vertical Cylinder & Top Door Type: 01
– Motorized Door Open & Close: 01
– Contamination protect shield plate: 01
– View window 8″: 01
– View window 8″ Shutter: 01
– Chamber Illumination: 01
Substrate Module:
– 4″ Sample holder: 01
– Halogen Lamp type(Max700℃),Water Cooling: 01
– Sample Rotation/0~30rpm: 01
– Z-Motion manipulator 2″ Travel: 01
– Sample Shutter/Pneumatic: 01
Cathode Module:
– RF Power & Auto matcher 600W: 02
– DC Power 750w: 02
– 2″ Magnetron Sputter Gun & Shutter: 04

If you have extra question or have some projects having this product, please feel free to reach out to us!

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